×
復(fù)制成功
微信號(hào)：13061644116
添加微信好友，了解更多產(chǎn)品詳情。
| 貨號(hào) | 操作 | 名稱 | 描述 |
|---|
| 圖片 | 名稱 | 貨號(hào)貨期 | 描述 | 價(jià)格 |
|---|
(LightSmyth Nanopatterned Silicon Stamps 納米圖案硅片)
LightSmyth提供了大量的納米加工單晶硅襯底，為工業(yè)和學(xué)術(shù)機(jī)構(gòu)提供了一個(gè)低成本的納米光子學(xué)研究入口?；卓捎糜诠鈱W(xué)、光子學(xué)、生物學(xué)、化學(xué)、物理學(xué)（如中子散射）、聚合物研究、納米印跡、微流體學(xué)等領(lǐng)域。如果需要，基板可以涂上金屬或介質(zhì)涂層。大多數(shù)地表特征具有略微梯形的橫截面輪廓，具有直線平行的臺(tái)地和溝渠。晶格狀結(jié)構(gòu)也可用。提供了許多特征尺寸和溝槽深度。基板的掃描電鏡圖像可以在裝運(yùn)前拍攝，以驗(yàn)證準(zhǔn)確的輪廓。
表中顯示的維度表示目標(biāo)值。周期精度優(yōu)于0.5%，槽深、線寬、間距與目標(biāo)值相差15%。文中給出了掃描電鏡圖。如果需要更精確的尺寸信息，LightSmyth可以提供您訂購(gòu)的特定納米棉片的掃描電鏡，作為可選服務(wù)。
Nanopatterned Silicon Stamps
II-VI offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.
Dimensions shown in the table represent target value. Period has accuracy better than 0.5% while groove depth and the width of line and space may differ from the target values by 15%. SEM are given for illustration purposes. If more precise dimensional information is required, we may provide an SEM of the specific piece of nanostamp you order as an optional service
(LightSmyth Nanopatterned Silicon Stamps 納米圖案硅片)
描述 | 數(shù)據(jù) |
基材寬度高度誤差 | 標(biāo)準(zhǔn)公差±0.2 mm |
凈孔徑（CA） | 距基板邊緣0.5 mm（圖案可延伸至基板邊緣） |
基底厚度 | 0.675 ± 0.050 mm |
CA的表面質(zhì)量 | P／N以“p”結(jié)尾：劃痕/挖：最大劃痕寬度，最大最大直徑?？商峁└哌_(dá)20/10的規(guī)格 |
CA的表面質(zhì)量 | P/N以“-S”結(jié)尾：由于表面質(zhì)量而打折的等級(jí)。至少有80%的可用面積?？赡艹霈F(xiàn)80/100劃痕/挖痕/顆粒和不規(guī)則基底形狀 |
CA外表面質(zhì)量 | 無(wú)要求 |
Material材料 | 單晶硅，反應(yīng)離子刻蝕 |
2D Nanostamps
Part Number | 周期 Period(nm) | 晶體類型 Lattice Type | 槽深 Groove Depth(nm) | 特征寬度 Feature Width(nm) | Size(mm) |
S2D-18B2-0808-350-P | 600 | Rect Post | 350 | 275 | 8.0 x 8.3 |
S2D-18B3-0808-350-P | 700 | Rect Post | 350 | 350 | 8.0 x 8.3 |
S2D-18C2-0808-350-P | 600 | Hex Post | 350 | 240 | 8.0 x 8.3 |
S2D-18C3-0808-150-P | 700 | Hex Post | 150 | 290 | 8.0 x 8.3 |
S2D-18C3-0808-350-P | 700 | Hex Post | 350 | 290 | 8.0 x 8.3 |
S2D-18D3-0808-350-P | 700 | Hex Hole | 350 | 200 | 8.0 x 8.3 |
S2D-24B2-0808-150-P | 600 | Rect Post | 150 | 195 | 8.0 x 8.3 |
S2D-24B2-0808-350-P | 600 | Rect Post | 350 | 195 | 8.0 x 8.3 |
S2D-24B3-0808-150-P | 700 | Rect Post | 150 | 260 | 8.0 x 8.3 |
S2D-24B3-0808-350-P | 700 | Rect Post | 350 | 260 | 8.0 x 8.3 |
S2D-24C2-0808-150-P | 600 | Hex Post | 150 | 165 | 8.0 x 8.3 |
S2D-24C2-0808-350-P | 600 | Hex Post | 350 | 165 | 8.0 x 8.3 |
S2D-24C3-0808-150-P | 700 | Hex Post | 150 | 220 | 8.0 x 8.3 |
S2D-24D2-0808-150-P | 600 | Hex Hole | 150 | 180 | 8.0 x 8.3 |
S2D-24D2-0808-350-P | 600 | Hex Hole | 350 | 180 | 8.0 x 8.3 |
S2D-24D3-0808-150-P | 700 | Hex Hole | 150 | 290 | 8.0 x 8.3 |
S2D-24D3-0808-350-P | 700 | Hex Hole | 350 | 290 | 8.0 x 8.3 |
Linear Nanostamps (line+space)
型號(hào) | 周期間隔(nm) | 槽深 (nm) | 占空比 | 線寬 (nm) | 尺寸 | SEM link1 | Top down |
SNS-C72-1212-50-P | 139 | 50 | 50% | 69.5 | 12.5×12.5×0.7 | X-sec | Top down |
SNS-C72-2525-50-P | 139 | 50 | 50% | 69.5 | 25×25×0.7 5 | X-sec | Top down |
SNS-C36-1212-110-P | 278 | 110 | 50% | 139 | 12.5×12.5×0.7 | X-sec | Top down |
SNS-C24-1212-110-P | 416.6 | 110 | 50% | 208 | 12.5×12.5×0.7 | X-sec | Top down |
SNS-C20-0808-150-D45-P | 500 | 150 | 44% | 220 | 8×8.3×0.7 | Top down | |
SNS-C20-0808-350-D45-P | 500 | 350 | 44% | 220 | 8×8.3×0.7 | Top down | |
SNS-C20-0808-150-D60-P | 500 | 150 | 60% | 300 | 8×8.3×0.7 | Top down | |
SNS-C20-0808-350-D60-P | 500 | 350 | 60% | 300 | 8×8.3×0.7 | Top down | |
SNS-C18-2009-110-D50-P | 555.5 | 110 | 50% | 278 | 20×9×0.7 | X-sec | Top down |
SNS-C18-2009-140-D50-P | 555.5 | 140 | 50% | 278 | 20×9×0.7 | X-sec | Top down |
SNS-C18-2009-110-D29-P | 555.5 | 110 | 29% | 158 | 20×9×0.7 | X-sec | Top down |
SNS-C18-2009-140-D29-P | 555.5 | 140 | 29% | 158 | 20×9×0.7 | X-sec | Top down |
SNS-C16.7-0808-150-D45-P | 600 | 150 | 43% | 260 | 8×8.3×0.7 | Top down | |
SNS-C16.7-0808-350-D45-P | 600 | 350 | 43% | 260 | 8×8.3×0.7 | Top down | |
SNS-C16.7-0808-150-D55-P | 600 | 150 | 55% | 330 | 8×8.3×0.7 | Top down | |
SNS-C16.7-0808-350-D55-P | 600 | 350 | 55% | 330 | 8×8.3×0.7 | Top down | |
SNS-C16.5-2912-190-P | 606 | 190 | 50% | 303 | 29×12×0.7 | X-sec | Top down |
SNS-C16.5-2912-190-S 4 | 606 | 190 | 50% | 303 | 29×12×0.7 | X-sec | Top down |
SNS-C16.5-2924-190-P | 606 | 190 | 50% | 303 | 29×24.2×0.7 5 | X-sec | Top down |
SNS-C14.8-2410-170-P | 675 | 170 | 32% | 218 | 24×10×0.7 | ||
SNS-C14.8-2430-170-P | 675 | 170 | 32% | 218 | 24×30.4×0.7 5 | ||
SNS-C14.3-0808-150-D45-P | 700 | 150 | 47% | 330 | 8×8.3×0.7 | Top down | |
SNS-C14.3-0808-350-D45-P | 700 | 350 | 47% | 330 | 8×8.3×0.7 | Top down | |
SNS-C14.3-0808-150-D55-P | 700 | 150 | 55% | 375 | 8×8.3×0.7 | Top down | |
SNS-C14.3-0808-150-D55-P | 700 | 150 | 55% | 375 | 8×8.3×0.7 | Top down | |
SNS-C12-1212-200-P | 833.3 | 200 | 50% | 416 | 12.5×12.5×0.7 | X-sec | Top down |
SNS-C12-2525-200-P | 833.3 | 200 | 50% | 416 | 25×25×0.7 5 | X-sec | Top down |
SNS-C11.7-1212-200-P | 855 | 200 | 50% | 428 | 12.5×12.5×0.7 | ||
SNS-C11.7-2525-200-P | 855 | 200 | 50% | 428 | 25×25×0.7 5 |
2D nanostamps (rectangular and hexagonal lattice)
型號(hào) | 周期間隔(nm) | 晶體類型 | 槽深 (nm) | 線寬 (nm) | 尺寸 | 型號(hào) |
S2D-24B3-0808-150-P | 700 | rect post | 150 | 260 | 8×8.3×0.7 | Top down |
S2D-24B3-0808-350-P | 700 | rect post | 350 | 260 | 8×8.3×0.7 | Top down |
S2D-18B3-0808-150-P | 700 | rect post | 150 | 350 | 8×8.3×0.7 | Top down |
S2D-18B3-0808-350-P | 700 | rect post | 350 | 350 | 8×8.3×0.7 | Top down |
S2D-24C2-0808-150-P | 600 | hex post | 150 | 165 | 8×8.3×0.7 | Top down |
S2D-24C2-0808-350-P | 600 | hex post | 350 | 165 | 8×8.3×0.7 | Top down |
S2D-18C2-0808-150-P | 600 | hex post | 150 | 240 | 8×8.3×0.7 | Top down |
S2D-18C2-0808-350-P | 600 | hex post | 350 | 240 | 8×8.3×0.7 | Top down |
S2D-24C3-0808-150-P | 700 | hex post | 150 | 220 | 8×8.3×0.7 | Top down |
S2D-24C3-0808-350-P | 700 | hex post | 350 | 220 | 8×8.3×0.7 | Top down |
S2D-18C3-0808-150-P | 700 | hex post | 150 | 290 | 8×8.3×0.7 | Top down |
S2D-18C3-0808-350-P | 700 | hex post | 350 | 290 | 8×8.3×0.7 | Top down |
S2D-24D2-0808-150-P | 600 | hex hole | 150 | 180 | 8×8.3×0.7 | Top down |
S2D-24D2-0808-350-P | 600 | hex hole | 350 | 180 | 8×8.3×0.7 | Top down |
S2D-18D3-0808-150-P | 700 | hex hole | 150 | 200 | 8×8.3×0.7 | Top down |
S2D-18D3-0808-350-P | 700 | hex hole | 350 | 200 | 8×8.3×0.7 | Top down |
S2D-24D3-0808-150-P | 700 | hex hole | 150 | 290 | 8×8.3×0.7 | Top down |
S2D-24D3-0808-350-P | 700 | hex hole | 350 | 290 | 8×8.3×0.7 | Top down |
New nanostamps are added to our stock frequently. Please contact our application scientists if you cannot find a nanostructure you need in our stock list.
如何清潔光柵
為了去除油脂和其他污染物，傳輸光柵可在室溫Liquinox溶液中浸泡不超過(guò)5分鐘，在三個(gè)蒸餾水中漂洗，并使用無(wú)油噴嘴用干凈干燥的壓縮氮?dú)獯蹈?，同時(shí)用鑷子夾住格柵（不要使用罐上的灰塵，因?yàn)槠渑欧盼锸艿礁叨任廴荆?。切勿讓水在格柵表面干燥，?yīng)將其吹走。氮?dú)鈶?yīng)該來(lái)自油箱或無(wú)油壓縮機(jī)
http://www.alconox.com/Resources/TechnicalBulletin.aspx?plid=3
為了在這個(gè)過(guò)程中固定光柵，可以使用Nalgene?聚丙烯剪刀式鑷子。
http://www.thermoscientific.com/en/product/nalgene-polypropylene-scissor-type-forceps.html
營(yíng)業(yè)執(zhí)照